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In-depth static and low frequency noise assessment of p-channel gate-all-around vertically stacked silicon nanosheets
Publication:
In-depth static and low frequency noise assessment of p-channel gate-all-around vertically stacked silicon nanosheets
Date
2023
Journal article
https://doi.org/10.1016/j.sse.2023.108591
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cretu, B.
;
Veloso, Anabela
;
Simoen, Eddy
Journal
SOLID-STATE ELECTRONICS
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1230
since deposited on 2023-06-11
Acq. date: 2025-10-23
Citations
Metrics
Views
1230
since deposited on 2023-06-11
Acq. date: 2025-10-23
Citations