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Identification of critical parameters for plasma process-induced damage in 130 and 100 nm CMOS technologies

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dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorTokei, Zsolt
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.date.accessioned2021-10-14T23:30:57Z
dc.date.available2021-10-14T23:30:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6921
dc.source.beginpage271
dc.source.conferenceESSDERC - 32nd European Solid-State Device Research Conference
dc.source.conferencedate24/09/2002
dc.source.conferencelocationFirenze Italy
dc.source.endpage274
dc.title

Identification of critical parameters for plasma process-induced damage in 130 and 100 nm CMOS technologies

dc.typeProceedings paper
dspace.entity.typePublication
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