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A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications
Publication:
A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications
Date
2020
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ali, Tarek
;
Seidel, Konrad
;
Kuhnel, Kati
;
Rudolph, Matthias
;
Czernohorsky, Malte
;
Mertens, Konstantin
;
Hoffmann, Raik
;
Zimmermann, Katrin
;
Muehle, Uwe
;
Mueller, Johannes
;
Van Houdt, Jan
;
Eng, Lukas M.
Journal
na
Abstract
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1769
since deposited on 2021-11-02
Acq. date: 2025-10-29
Citations
Metrics
Views
1769
since deposited on 2021-11-02
Acq. date: 2025-10-29
Citations