Publication:

A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications

Date

2020
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorAli, Tarek
dc.contributor.authorSeidel, Konrad
dc.contributor.authorKuhnel, Kati
dc.contributor.authorRudolph, Matthias
dc.contributor.authorCzernohorsky, Malte
dc.contributor.authorMertens, Konstantin
dc.contributor.authorHoffmann, Raik
dc.contributor.authorZimmermann, Katrin
dc.contributor.authorMuehle, Uwe
dc.contributor.authorMueller, Johannes
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorEng, Lukas M.
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecVan Houdt, Jan::1234-1234-1234-1235
dc.date.accessioned2022-01-28T07:50:12Z
dc.date.available2021-11-02T15:59:33Z
dc.date.available2022-01-28T07:50:12Z
dc.date.issued2020
dc.identifier.eisbn978-1-7281-6460-1
dc.identifier.issn0743-1562
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37758
dc.publisherIEEE
dc.source.conferenceIEEE Symposium on VLSI Technology and Circuits
dc.source.conferencedateJUN 15-19, 2020
dc.source.conferencelocationVirtual
dc.source.journalna
dc.source.numberofpages2
dc.title

A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions