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Boron-doped selective silicon epitaxy: high efficiency and process simplification in interdigitated back contact cells
Publication:
Boron-doped selective silicon epitaxy: high efficiency and process simplification in interdigitated back contact cells
Date
2014
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Recaman Payo, Maria
;
Posthuma, Niels
;
Uruena De Castro, Angel
;
Debucquoy, Maarten
;
Poortmans, Jef
Journal
Progress in Photovoltaics Research and Applications
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1927
since deposited on 2021-10-22
Acq. date: 2025-10-28
Citations
Metrics
Views
1927
since deposited on 2021-10-22
Acq. date: 2025-10-28
Citations