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Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking
Publication:
Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking
Date
2024
Journal article
https://doi.org/10.1021/acs.chemmater.3c02628
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Naqvi, Bilal
;
Enomoto, Satoshi
;
Machida, Kohei
;
Takata, Yui
;
Kozawa, Takahiro
;
Muroya, Yusa
;
De Gendt, Stefan
;
De Simone, Danilo
Journal
CHEMISTRY OF MATERIALS
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620
since deposited on 2024-02-18
Acq. date: 2025-10-25
Citations
Metrics
Views
620
since deposited on 2024-02-18
Acq. date: 2025-10-25
Citations