Publication:

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking

Date

2024
Journal article
https://doi.org/10.1021/acs.chemmater.3c02628
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dc.contributor.authorNaqvi, Bilal
dc.contributor.authorEnomoto, Satoshi
dc.contributor.authorMachida, Kohei
dc.contributor.authorTakata, Yui
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorMuroya, Yusa
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorNaqvi, Bilal
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecNaqvi, Bilal::0000-0002-9080-6475
dc.date.accessioned2024-10-07T09:31:11Z
dc.date.available2024-02-18T17:53:10Z
dc.date.available2024-10-07T09:31:11Z
dc.date.issued2024
dc.identifier.doi10.1021/acs.chemmater.3c02628
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43564
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage1459
dc.source.endpage1471
dc.source.issue3
dc.source.journalCHEMISTRY OF MATERIALS
dc.source.numberofpages13
dc.source.volume36
dc.title

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking

dc.typeJournal article
dspace.entity.typePublication
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