Impact of monolayer WS2 surface properties on the gate dielectrics formation by atomic layer deposition

Lin, Zaoyang; Dekelver, Sven; Cott, Daire; Groven, Benjamin; Sergeant, Stefanie; Conard, Thierry; Wu, Xiangyu; Morin, Pierre; Lin, Dennis; Lockhart de la Rosa, Cesar Javier; Kar, Gouri Sankar; Delabie, Annelies

doi:10.1116/6.0003894

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Impact of monolayer WS2 surface properties on the gate dielectrics formation by atomic layer deposition

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2024

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https://doi.org/10.1116/6.0003894

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Lockhart de la Rosa, Cesar Javier

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Kar, Gouri Sankar

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Delabie, Annelies

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

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Acq. date: 2026-05-18

Impact of monolayer WS2 surface properties on the gate dielectrics formation by atomic layer deposition

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