Publication:

Impact of monolayer WS2 surface properties on the gate dielectrics formation by atomic layer deposition

Date

2024
Journal article
https://doi.org/10.1116/6.0003894
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Author(s)

Lin, Zaoyang  
;
Dekelver, Sven  
;
Cott, Daire  
;
Groven, Benjamin  
;
Sergeant, Stefanie  
;
Conard, Thierry  
;
Wu, Xiangyu  
;
Morin, Pierre  
;
Lin, Dennis  
;
Lockhart de la Rosa, Cesar Javier  
;
Kar, Gouri Sankar  
;
Delabie, Annelies  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

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163 since deposited on 2024-11-10
Acq. date: 2026-02-25

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163 since deposited on 2024-11-10
Acq. date: 2026-02-25

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