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Deep electron traps in HfO2-based ferroelectrics: (Al/Si-doped) HfO2 versus HfZrO4
Publication:
Deep electron traps in HfO2-based ferroelectrics: (Al/Si-doped) HfO2 versus HfZrO4
Date
2022
Journal article
https://doi.org/10.1016/j.sse.2022.108388
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Izmailov, R. A.
;
O'Sullivan, Barry
;
Popovici, Mihaela Ioana
;
Afanas'ev, V. V.
Journal
SOLID-STATE ELECTRONICS
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1748
since deposited on 2022-06-23
Acq. date: 2025-10-23
Citations
Metrics
Views
1748
since deposited on 2022-06-23
Acq. date: 2025-10-23
Citations