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Challenges in the implentation of low-k dielectrics in the back-end of line
Publication:
Challenges in the implentation of low-k dielectrics in the back-end of line
Date
2005
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hoofman, Romano
;
Brom - Verheyden, Greja
;
Michelon, Julien
;
Iacopi, Francesca
;
Travaly, Youssef
;
Baklanov, Mikhaïl
;
Tokei, Zsolt
;
Beyer, Gerald
Journal
Microelectronic Engineering
Abstract
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1998
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1998
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations