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Assessing the performance of two-dimensional dopant profiling techniques

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dc.contributor.authorDuhayon, Natasja
dc.contributor.authorEyben, Pierre
dc.contributor.authorFouchier, Marc
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAlvarez, David
dc.contributor.authorSchoemann, S.
dc.contributor.authorCiappa, M.
dc.contributor.authorStangoni, M.
dc.contributor.authorFichtner, W.
dc.contributor.authorFormanek, P.
dc.contributor.authorRaineri, V.
dc.contributor.authorGiannazzo, F.
dc.contributor.authorGoghero, D.
dc.contributor.authorRosenwaks, Y.
dc.contributor.authorShikler, R.
dc.contributor.authorSaraf, S.
dc.contributor.authorSadewasser, S.
dc.contributor.authorBarreau, N.
dc.contributor.authorGlatzel, T.
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:35:32Z
dc.date.available2021-10-15T04:35:32Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7535
dc.source.beginpage215
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
dc.source.endpage226
dc.title

Assessing the performance of two-dimensional dopant profiling techniques

dc.typeProceedings paper
dspace.entity.typePublication
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