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Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
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Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
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Date
2023
Journal article
https://doi.org/10.1117/1.JMM.22.2.024401
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kovalevich, Tatiana
;
Van Look, Lieve
;
Franke, Joern-Holger
;
Philipsen, Vicky
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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934
since deposited on 2023-08-27
Acq. date: 2025-12-10
Citations
Metrics
Views
934
since deposited on 2023-08-27
Acq. date: 2025-12-10
Citations