Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

dc.contributor.author	Kovalevich, Tatiana
dc.contributor.author	Van Look, Lieve
dc.contributor.author	Franke, Joern-Holger
dc.contributor.author	Philipsen, Vicky
dc.contributor.imecauthor	Kovalevich, Tatiana
dc.contributor.imecauthor	Van Look, Lieve
dc.contributor.imecauthor	Franke, Joern-Holger
dc.contributor.imecauthor	Philipsen, Vicky
dc.contributor.orcidimec	Franke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimec	Philipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimec	Kovalevich, Tatiana::0000-0001-9633-8257
dc.contributor.orcidimec	Van Look, Lieve::0009-0000-6198-024X
dc.date.accessioned	2024-03-11T15:17:38Z
dc.date.available	2023-08-27T17:28:47Z
dc.date.available	2024-03-11T15:17:38Z
dc.date.issued	2023
dc.identifier.doi	10.1117/1.JMM.22.2.024401
dc.identifier.issn	1932-5150
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/42404
dc.publisher	SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage	Art. 024401
dc.source.endpage	N/A
dc.source.issue	2
dc.source.journal	JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages	11
dc.source.volume	22
dc.title	Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
dc.type	Journal article
dspace.entity.type	Publication
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