Publication:

Subtractive etch of ruthenium for sub-5nm interconnect

Date

2018
Proceedings Paper
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dc.contributor.authorWan, Danny
dc.contributor.authorPaolillo, Sara
dc.contributor.authorRassoul, Nouredine
dc.contributor.authorKutrzeba Kotowska, Bogumila
dc.contributor.authorBlanco, Victor
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorErcken, Monique
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorWan, Danny
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorRassoul, Nouredine
dc.contributor.imecauthorKutrzeba Kotowska, Bogumila
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecWan, Danny::0000-0003-4847-3184
dc.contributor.orcidimecRassoul, Nouredine::0000-0001-9489-3396
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2021-10-26T09:05:10Z
dc.date.available2021-10-26T09:05:10Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32240
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8454841
dc.source.beginpage10
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate4/06/2018
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage12
dc.title

Subtractive etch of ruthenium for sub-5nm interconnect

dc.typeProceedings paper
dspace.entity.typePublication
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