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Precursor Design for Aerosol‐Assisted Plasma Deposition of Poly(Ethylene Oxide)‐Like Thin Films: Deposition Mechanism and Film Properties

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dc.contributor.authorDekoster, Tijs
dc.contributor.authorVan Roy, Wim
dc.contributor.authorJans, Karolien
dc.contributor.authorVos, Rita
dc.contributor.authorNisol, Bernard
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2026-01-22T13:09:06Z
dc.date.available2026-01-22T13:09:06Z
dc.date.issued2025
dc.description.abstractAerosol‐assisted plasma deposition using a cold atmospheric pressure plasma jet is promising for deposition of poly(ethyleneoxide)‐like antifouling coatings. However, the impact of precursor volatility and viscosity is currently not well understood. Decreasing the volatility by increasing the number of ethylene oxide repeats in poly(ethylene glycol) dimethacrylate precursors improves the material balance consistent with less precursor evaporation during transport and on the substrate. As more and larger droplets reach the substrate, this also influences the plasma polymerization. This does not limit film formation from dimethacrylate precursors with nine ethylene glycol units resulting in stable films with good antifouling properties. Better understanding of the mechanisms during aerosol‐assisted plasma deposition will facilitate design of adequate precursors for deposition of multifunctional coatings.
dc.identifier.doihttps://doi.org/10.1002/ppap.70032
dc.identifier.issn1612-8869
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58700
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherWiley
dc.source.beginpage70032
dc.source.issue7
dc.source.journalPlasma Processes and Polymers
dc.source.numberofpages15
dc.source.volume22
dc.title

Precursor Design for Aerosol‐Assisted Plasma Deposition of Poly(Ethylene Oxide)‐Like Thin Films: Deposition Mechanism and Film Properties

dc.typeJournal article
dspace.entity.typePublication
dspace.file.typePDF
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