Publication:
CMOS integration of thermally stable diffusion and gate replacement (D&GR) high-k/metal gate stacks in DRAM periphery transistors
Date
| dc.contributor.author | Dentoni Litta, Eugenio | |
| dc.contributor.author | Ritzenthaler, Romain | |
| dc.contributor.author | Schram, Tom | |
| dc.contributor.author | Spessot, Alessio | |
| dc.contributor.author | O'Sullivan, Barry | |
| dc.contributor.author | Ji, Yunhyuck | |
| dc.contributor.author | Mannaert, Geert | |
| dc.contributor.author | Lorant, Christophe | |
| dc.contributor.author | Sebaai, Farid | |
| dc.contributor.author | Thiam, Arame | |
| dc.contributor.author | Ercken, Monique | |
| dc.contributor.author | Demuynck, Steven | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
| dc.contributor.imecauthor | Ritzenthaler, Romain | |
| dc.contributor.imecauthor | Schram, Tom | |
| dc.contributor.imecauthor | Spessot, Alessio | |
| dc.contributor.imecauthor | O'Sullivan, Barry | |
| dc.contributor.imecauthor | Mannaert, Geert | |
| dc.contributor.imecauthor | Lorant, Christophe | |
| dc.contributor.imecauthor | Sebaai, Farid | |
| dc.contributor.imecauthor | Thiam, Arame | |
| dc.contributor.imecauthor | Ercken, Monique | |
| dc.contributor.imecauthor | Demuynck, Steven | |
| dc.contributor.imecauthor | Horiguchi, Naoto | |
| dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
| dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
| dc.contributor.orcidimec | O'Sullivan, Barry::0000-0002-9036-8241 | |
| dc.contributor.orcidimec | Lorant, Christophe::0000-0001-7363-9348 | |
| dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
| dc.date.accessioned | 2021-10-24T04:10:53Z | |
| dc.date.available | 2021-10-24T04:10:53Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2017 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28218 | |
| dc.source.beginpage | 533 | |
| dc.source.conference | 49th International Conferece on Solid State Devices and Materials - SSDM | |
| dc.source.conferencedate | 19/09/2017 | |
| dc.source.conferencelocation | Sendai Japan | |
| dc.source.endpage | 534 | |
| dc.title | CMOS integration of thermally stable diffusion and gate replacement (D&GR) high-k/metal gate stacks in DRAM periphery transistors | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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