Publication:

Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1918 since deposited on 2021-10-16
2last month
Acq. date: 2026-02-26

Citations

Statistics

Views

1918 since deposited on 2021-10-16
2last month
Acq. date: 2026-02-26

Citations