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Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development

Date

2005-06
Journal article
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dc.contributor.authorBeckx, Stephan
dc.contributor.authorDemand, Marc
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorHenson, Kirklen
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorShamiryan, Denis
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBiesemans, Serge
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorVertommen, Johan
dc.contributor.authorCoenegrachts, Bart
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-16T00:44:47Z
dc.date.available2021-10-16T00:44:47Z
dc.date.issued2005-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10074
dc.source.beginpage1007
dc.source.endpage1011
dc.source.issue5_6
dc.source.journalMicroelectronics Reliability
dc.source.volume45
dc.title

Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development

dc.typeJournal article
dspace.entity.typePublication
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