Publication:

Bias temperature instability effects in devices with fully-silicided gate stacks, strained-Si and multiple-gate architectures

Date

2008-12
Dissertation
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dc.contributor.authorShickova, Adelina
dc.contributor.thesisadvisorGroeseneken, Guido
dc.contributor.thesisadvisorMaes, Herman
dc.date.accessioned2021-10-17T10:42:33Z
dc.date.available2021-10-17T10:42:33Z
dc.date.embargo9999-12-31
dc.date.issued2008-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14464
dc.title

Bias temperature instability effects in devices with fully-silicided gate stacks, strained-Si and multiple-gate architectures

dc.typePHD thesis
dspace.entity.typePublication
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