Publication:
Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
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1157 since deposited on 2023-06-20
1last month
Acq. date: 2026-01-12
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1157 since deposited on 2023-06-20
1last month
Acq. date: 2026-01-12
Citations