Publication:

Limitations to copper grain growth in narrow trenches

Date

2001
Proceedings Paper
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dc.contributor.authorBrongersma, Sywert
dc.contributor.authorKerr, Emma
dc.contributor.authorVervoort, Iwan
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.date.accessioned2021-10-14T16:39:10Z
dc.date.available2021-10-14T16:39:10Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5100
dc.source.beginpage230
dc.source.conferenceProceedings of the IEEE 2001 International Interconnect Technology Conference
dc.source.conferencedate4/06/2001
dc.source.conferencelocationBurlingame, CA USA
dc.source.endpage232
dc.title

Limitations to copper grain growth in narrow trenches

dc.typeProceedings paper
dspace.entity.typePublication
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