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A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

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dc.contributor.authorTravaly, Youssef
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.contributor.authorAbell, Thomas
dc.contributor.authorSomers, K.R.F
dc.contributor.authorHendrickx, M.F.A
dc.contributor.authorVanquickenborne, L.G.
dc.contributor.authorCeulemans, A.
dc.contributor.authorJonas, A.M
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-16T05:47:14Z
dc.date.available2021-10-16T05:47:14Z
dc.date.issued2005-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11331
dc.source.beginpage083515-1
dc.source.endpage083515-9
dc.source.issue8
dc.source.journalJournal of Applied Physics
dc.source.volume98
dc.title

A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

dc.typeJournal article
dspace.entity.typePublication
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