Publication:

Application of a new approach to optical proximity correction

Date

1999
Proceedings Paper
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dc.contributor.authorRosenbusch, A.
dc.contributor.authorHourd, A.
dc.contributor.authorJuffermans, Casper
dc.contributor.authorKirsch, H.
dc.contributor.authorLalanne, F.
dc.contributor.authorMaurer, W.
dc.contributor.authorRomeo, C.
dc.contributor.authorRonse, Kurt
dc.contributor.authorSchiavone, P.
dc.contributor.authorSimecek, M.
dc.contributor.authorToublan, O.
dc.contributor.authorVermeulen, Tom
dc.contributor.authorWatson, J.
dc.contributor.authorZiegler, W.
dc.contributor.authorZimmerman, R.
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-14T11:35:53Z
dc.date.available2021-10-14T11:35:53Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3781
dc.source.beginpage639
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate17/03/1999
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage647
dc.title

Application of a new approach to optical proximity correction

dc.typeProceedings paper
dspace.entity.typePublication
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