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Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
Publication:
Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
Date
2011
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Waldron, Niamh
;
Nguyen, Duy
;
Lin, Dennis
;
Brammertz, Guy
;
Vincent, Benjamin
;
Firrincieli, Andrea
;
Winderickx, Gillis
;
Sioncke, Sonja
;
De Jaeger, Brice
;
Wang, Gang
;
Mitard, Jerome
;
Wang, Wei-E
;
Heyns, Marc
;
Caymax, Matty
;
Meuris, Marc
;
Absil, Philippe
;
Hoffmann, Thomas Y.
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Abstract
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1970
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations
Metrics
Views
1970
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations