Publication:
Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment
Date
| dc.contributor.author | Waldron, Niamh | |
| dc.contributor.author | Nguyen, Duy | |
| dc.contributor.author | Lin, Dennis | |
| dc.contributor.author | Brammertz, Guy | |
| dc.contributor.author | Vincent, Benjamin | |
| dc.contributor.author | Firrincieli, Andrea | |
| dc.contributor.author | Winderickx, Gillis | |
| dc.contributor.author | Sioncke, Sonja | |
| dc.contributor.author | De Jaeger, Brice | |
| dc.contributor.author | Wang, Gang | |
| dc.contributor.author | Mitard, Jerome | |
| dc.contributor.author | Wang, Wei-E | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Meuris, Marc | |
| dc.contributor.author | Absil, Philippe | |
| dc.contributor.author | Hoffmann, Thomas Y. | |
| dc.contributor.imecauthor | Waldron, Niamh | |
| dc.contributor.imecauthor | Lin, Dennis | |
| dc.contributor.imecauthor | Brammertz, Guy | |
| dc.contributor.imecauthor | Vincent, Benjamin | |
| dc.contributor.imecauthor | Firrincieli, Andrea | |
| dc.contributor.imecauthor | Winderickx, Gillis | |
| dc.contributor.imecauthor | De Jaeger, Brice | |
| dc.contributor.imecauthor | Mitard, Jerome | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.imecauthor | Meuris, Marc | |
| dc.contributor.imecauthor | Absil, Philippe | |
| dc.contributor.orcidimec | Brammertz, Guy::0000-0003-1404-7339 | |
| dc.contributor.orcidimec | De Jaeger, Brice::0000-0001-8804-7556 | |
| dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
| dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
| dc.date.accessioned | 2021-10-19T21:36:32Z | |
| dc.date.available | 2021-10-19T21:36:32Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2011 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20125 | |
| dc.source.beginpage | 299 | |
| dc.source.conference | Dielectrics in Nanosystems -and- Graphene, Ge/III-V, Nanowires and Emerging Materials for Post-CMOS Applications 3 | |
| dc.source.conferencedate | 1/05/2011 | |
| dc.source.conferencelocation | Montreal Canada | |
| dc.source.endpage | 309 | |
| dc.title | Heterogeneous integration and fabrication of III-V MOS devices in a 200mm processing environment | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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