Publication:

Impact of tungsten oxidation conditions on the performance of Al2O3/WOx-based CBRAM devices

Date

2017
Journal article
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dc.contributor.authorChen, Zhe
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorChen, Michael
dc.contributor.authorRadhakrishnan, Janaki
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorKang, J.
dc.contributor.authorGoux, Ludovic
dc.contributor.authorKar, Gouri Sankar
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorRadhakrishnan, Janaki
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.accessioned2021-10-24T03:26:48Z
dc.date.available2021-10-24T03:26:48Z
dc.date.issued2017
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28021
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931717301612
dc.source.beginpage56
dc.source.endpage59
dc.source.journalMicroelectronic Engineering
dc.source.volume178
dc.title

Impact of tungsten oxidation conditions on the performance of Al2O3/WOx-based CBRAM devices

dc.typeJournal article
dspace.entity.typePublication
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