Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Dissertations
Reliability of high mobility (si)Ge channel pMOSFETs for future CMOS applications: toward reliable ultra-thin EOT nanoscale transistors
Publication:
Reliability of high mobility (si)Ge channel pMOSFETs for future CMOS applications: toward reliable ultra-thin EOT nanoscale transistors
Copy permalink
Date
2013-01
Dissertation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
28080.pdf
11.63 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franco, Jacopo
Journal
Abstract
Description
Metrics
Downloads
2
since deposited on 2021-10-21
Acq. date: 2025-12-16
Views
1884
since deposited on 2021-10-21
Acq. date: 2025-12-16
Citations
Metrics
Downloads
2
since deposited on 2021-10-21
Acq. date: 2025-12-16
Views
1884
since deposited on 2021-10-21
Acq. date: 2025-12-16
Citations