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Advanced USJ for high-k / metal gate CMOS devices

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dc.contributor.authorAbsil, Philippe
dc.contributor.authorOrtolland, Claude
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorRosseel, Erik
dc.contributor.authorVerheyen, Peter
dc.contributor.authorVrancken, Christa
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorNoda, Tajii
dc.contributor.authorFelch, Susan
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-17T06:13:14Z
dc.date.available2021-10-17T06:13:14Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13279
dc.source.beginpageE4.7
dc.source.conferenceMRS Spring Meeting Symposium E: Doping Engineering for Front-End Processing
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Advanced USJ for high-k / metal gate CMOS devices

dc.typeMeeting abstract
dspace.entity.typePublication
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