Publication:
Low temperature Si homo-epitaxy by reduced pressure chemical vapor deposition using dichlorosilane, silane and trisilane
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1838 since deposited on 2021-10-19
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Acq. date: 2026-08-11
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Statistics
Views
1838 since deposited on 2021-10-19
2last month
1last week
Acq. date: 2026-08-11
Citations