Publication:

Aqueous chemical solution deposition of ultrathin high-k dielectric metal oxide films

Date

2007
Proceedings Paper
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dc.contributor.authorHardy, An
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDouheret, O.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorWitters, Thomas
dc.contributor.authorD'Olieslaeger, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.authorMullens, J.
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorD'Olieslaeger, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-16T16:29:54Z
dc.date.available2021-10-16T16:29:54Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12253
dc.source.conferenceInternational Symposium on Integrated Ferroelectrics - ISIF
dc.source.conferencedate8/05/2007
dc.source.conferencelocationBordeaux France
dc.title

Aqueous chemical solution deposition of ultrathin high-k dielectric metal oxide films

dc.typeProceedings paper
dspace.entity.typePublication
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