Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Publication:
Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Date
2009
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
19644.pdf
516.16 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lawrie, Kirsten
;
Blakey, Idriss
;
Blinco, James
;
Gronheid, Roel
;
Jack, Kevin
;
Pollentier, Ivan
;
Leeson, Michael
;
Younkin, Todd R.
;
Whittaker, Andrew K.
Journal
Abstract
Description
Metrics
Views
1930
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1930
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations