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Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

Date

2009
Proceedings Paper
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dc.contributor.authorLawrie, Kirsten
dc.contributor.authorBlakey, Idriss
dc.contributor.authorBlinco, James
dc.contributor.authorGronheid, Roel
dc.contributor.authorJack, Kevin
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeeson, Michael
dc.contributor.authorYounkin, Todd R.
dc.contributor.authorWhittaker, Andrew K.
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-17T23:46:57Z
dc.date.available2021-10-17T23:46:57Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15663
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

dc.typeProceedings paper
dspace.entity.typePublication
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