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Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures
Publication:
Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures
Date
2001
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Rita
;
Lux, Marcel
;
Xu, Kaidong
;
Fyen, Wim
;
Kenens, Conny
;
Conard, Thierry
;
Mertens, Paul
;
Heyns, Marc
;
Hatcher, Z.
;
Hoffman, M.
Journal
Journal of the Electrochemical Society
Abstract
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2007
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2007
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations