Publication:

Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures

Date

2001
Journal article
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dc.contributor.authorVos, Rita
dc.contributor.authorLux, Marcel
dc.contributor.authorXu, Kaidong
dc.contributor.authorFyen, Wim
dc.contributor.authorKenens, Conny
dc.contributor.authorConard, Thierry
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorHatcher, Z.
dc.contributor.authorHoffman, M.
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T18:21:29Z
dc.date.available2021-10-14T18:21:29Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5823
dc.source.beginpageG683
dc.source.endpageG691
dc.source.issue12
dc.source.journalJournal of the Electrochemical Society
dc.source.volume148
dc.title

Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures

dc.typeJournal article
dspace.entity.typePublication
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