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In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction

Date

2001
Journal article
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dc.contributor.authorZhao, Chao
dc.contributor.authorRoebben, G.
dc.contributor.authorBender, Hugo
dc.contributor.authorYoung, Edward
dc.contributor.authorHaukka, S.
dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVan der Biest, O.
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T18:33:02Z
dc.date.available2021-10-14T18:33:02Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5878
dc.source.beginpage995
dc.source.endpage998
dc.source.issue7
dc.source.journalMicroelectronics Reliability
dc.source.volume41
dc.title

In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction

dc.typeJournal article
dspace.entity.typePublication
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