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Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program
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Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hendrickx, Eric
;
Gronheid, Roel
;
Hermans, Jan
;
Lorusso, Gian
;
Foubert, Philippe
;
Pollentier, Ivan
;
Goethals, Mieke
;
Jonckheere, Rik
;
Vandenberghe, Geert
;
Ronse, Kurt
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Views
1872
since deposited on 2021-10-21
1
last month
1
last week
Acq. date: 2025-12-15
Citations