Publication:

Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program

Date

2013
Proceedings Paper
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dc.contributor.authorHendrickx, Eric
dc.contributor.authorGronheid, Roel
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorFoubert, Philippe
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-21T08:12:18Z
dc.date.available2021-10-21T08:12:18Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22473
dc.source.conferenceInternational Conference of Photopolymer Science and Technology - ICPST-30
dc.source.conferencedate25/06/2013
dc.source.conferencelocationChiba Japan
dc.title

Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program

dc.typeProceedings paper
dspace.entity.typePublication
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