Publication:

On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

Date

2004
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dc.contributor.authorOnsia, Bart
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDelabie, Annelies
dc.contributor.authorGottschalk, C.
dc.contributor.authorGreen, M.
dc.contributor.authorHeyns, Marc
dc.contributor.authorLin, S.
dc.contributor.authorMertens, Paul
dc.contributor.authorTsai, Wilman
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T15:10:46Z
dc.date.available2021-10-15T15:10:46Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9366
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
dc.title

On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

dc.typeOral presentation
dspace.entity.typePublication
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