Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Presentations
EUV resist process development for full field imaging
Publication:
EUV resist process development for full field imaging
Copy permalink
Date
2007
Presentation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
15222.pdf
426.91 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Niroomand, Ardavan
;
Goethals, Mieke
;
Van Roey, Frieda
;
Kim, Byeong Soo
;
Lorusso, Gian
;
Pollentier, Ivan
;
Jonckheere, Rik
;
Ronse, Kurt
Journal
Abstract
Description
Metrics
Views
1905
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-12
Citations
Metrics
Views
1905
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-12
Citations