Publication:

EUV resist process development for full field imaging

Date

2007
Presentation
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dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorKim, Byeong Soo
dc.contributor.authorLorusso, Gian
dc.contributor.authorPollentier, Ivan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-16T18:11:22Z
dc.date.available2021-10-16T18:11:22Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12622
dc.source.conferenceInternational EUVL Symposium
dc.source.conferencedate28/10/2007
dc.source.conferencelocationSapporo Japan
dc.title

EUV resist process development for full field imaging

dc.typeOral presentation
dspace.entity.typePublication
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