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Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition
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Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition
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Date
2024
Journal article
https://doi.org/10.1016/j.electacta.2024.144331
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Harold
;
Kim, Youjung
;
Yoo, Bongyoung
Journal
ELECTROCHIMICA ACTA
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597
since deposited on 2024-06-17
1
last month
Acq. date: 2025-12-16
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Metrics
Views
597
since deposited on 2024-06-17
1
last month
Acq. date: 2025-12-16
Citations