Publication:
Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition
| dc.contributor.author | Philipsen, Harold | |
| dc.contributor.author | Kim, Youjung | |
| dc.contributor.author | Yoo, Bongyoung | |
| dc.contributor.imecauthor | Philipsen, Harold | |
| dc.contributor.orcidimec | Philipsen, Harold::0000-0002-5029-1104 | |
| dc.date.accessioned | 2024-09-19T09:50:25Z | |
| dc.date.available | 2024-06-17T17:57:40Z | |
| dc.date.available | 2024-09-19T09:50:25Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | The authors would like to thank the core partners of IMEC 's Industrial Affiliation Program (IIAP) and the members of the MCA team for executing AFM and TEM analyses. This research was supported by MOTIE (Ministry of Trade, Industry, and Energy) in Korea, under the Fostering Global Talents for Innovative Growth Program (P0008745) supervised by KIAT (Korea Institute for Advancement of Technology) . | |
| dc.identifier.doi | 10.1016/j.electacta.2024.144331 | |
| dc.identifier.issn | 0013-4686 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44065 | |
| dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | |
| dc.source.beginpage | Art. 144331 | |
| dc.source.endpage | N/A | |
| dc.source.issue | August | |
| dc.source.journal | ELECTROCHIMICA ACTA | |
| dc.source.numberofpages | 11 | |
| dc.source.volume | 494 | |
| dc.subject.keywords | ION-EXCHANGE CHROMATOGRAPHY | |
| dc.subject.keywords | HYDROGEN-EVOLUTION REACTION | |
| dc.subject.keywords | SUPERCONFORMAL FILM GROWTH | |
| dc.subject.keywords | HYDROCHLORIC-ACID SOLUTION | |
| dc.subject.keywords | PAPER ELECTROPHORESIS | |
| dc.subject.keywords | RHODIUM(III) COMPLEXES | |
| dc.subject.keywords | CYCLIC VOLTAMMETRY | |
| dc.subject.keywords | NOBLE-METALS | |
| dc.subject.keywords | POLYCRYSTALLINE RHODIUM | |
| dc.subject.keywords | SOLUTION CHEMISTRY | |
| dc.title | Wet-chemical deposition of metals for advanced semiconductor technology nodes: Rh3+solution stability and Rh electrodeposition | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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