Publication:

Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis

Date

2023
Journal article
https://doi.org/10.35848/1347-4065/ace012
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dc.contributor.authorTakata, Yui
dc.contributor.authorMuroya, Yusa
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorMachida, Kohei
dc.contributor.authorEnomoto, Satoshi
dc.contributor.authorNaqvi, Bilal
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorNaqvi, Bilal
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecNaqvi, Bilal::0000-0002-9080-6475
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2024-03-12T10:57:10Z
dc.date.available2023-08-02T17:18:15Z
dc.date.available2024-03-12T10:57:10Z
dc.date.issued2023
dc.identifier.doi10.35848/1347-4065/ace012
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42255
dc.publisherIOP Publishing Ltd
dc.source.beginpageArt. 076502
dc.source.endpageN/A
dc.source.issue7
dc.source.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.source.numberofpages8
dc.source.volume62
dc.subject.keywordsNANOPARTICLE PHOTORESISTS
dc.subject.keywordsRESISTS
dc.title

Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and & gamma;-radiolysis

dc.typeJournal article
dspace.entity.typePublication
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