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H2O and O3 based atomic layer deposition of high-k dielectric layers on high mobility substrates

Date

2009
Proceedings Paper
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dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorAlian, AliReza
dc.contributor.authorBellenger, Florence
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSioncke, Sonja
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T21:54:51Z
dc.date.available2021-10-17T21:54:51Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15217
dc.source.conference9th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate19/07/2009
dc.source.conferencelocationMonterey, CA USA
dc.title

H2O and O3 based atomic layer deposition of high-k dielectric layers on high mobility substrates

dc.typeProceedings paper
dspace.entity.typePublication
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