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Articles
SLM device for 193 nm lithographic applications
Publication:
SLM device for 193 nm lithographic applications
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Date
2009
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19354.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lauria, John
;
Albright, R.
;
Vladimirsky, O.
;
Hoeks, M.
;
Vanneer, R.
;
van Drieenhuizen, B.
;
Chen, L.
;
Haspeslagh, Luc
;
Witvrouw, Ann
Journal
Microelectronic Engineering
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1889
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations
Metrics
Views
1889
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations