Publication:

SLM device for 193 nm lithographic applications

Date

2009
Journal article
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dc.contributor.authorLauria, John
dc.contributor.authorAlbright, R.
dc.contributor.authorVladimirsky, O.
dc.contributor.authorHoeks, M.
dc.contributor.authorVanneer, R.
dc.contributor.authorvan Drieenhuizen, B.
dc.contributor.authorChen, L.
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorWitvrouw, Ann
dc.contributor.imecauthorHaspeslagh, Luc
dc.date.accessioned2021-10-17T23:44:19Z
dc.date.available2021-10-17T23:44:19Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15653
dc.source.beginpage569
dc.source.endpage572
dc.source.issue4_6
dc.source.journalMicroelectronic Engineering
dc.source.volume86
dc.title

SLM device for 193 nm lithographic applications

dc.typeJournal article
dspace.entity.typePublication
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