Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Electromigration-driven void nucleation and growth in 30nm wide Cu line: Metal cap impact on interfacial Cu diffusion
Publication:
Electromigration-driven void nucleation and growth in 30nm wide Cu line: Metal cap impact on interfacial Cu diffusion
Copy permalink
Date
2013
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kirimura, Tomoyuki
;
Croes, Kristof
;
Siew, Yong Kong
;
Vanstreels, Kris
;
Czarnecki, Piotr
;
El-Mekki, Zaid
;
van der Veen, Marleen
;
Dictus, Dries
;
Yoon, A.
;
Kolics, A.
;
Boemmels, Juergen
;
Tokei, Zsolt
Journal
Abstract
Description
Metrics
Views
1925
since deposited on 2021-10-21
2
last month
Acq. date: 2025-12-14
Citations
Metrics
Views
1925
since deposited on 2021-10-21
2
last month
Acq. date: 2025-12-14
Citations