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Drying of high aspect ratio structures: a comparison of drying techniques via electrical stiction analysis

Date

2008
Meeting abstract
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dc.contributor.authorPacco, Antoine
dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.contributor.authorWada, Masayuki
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-17T09:33:37Z
dc.date.available2021-10-17T09:33:37Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14262
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
dc.title

Drying of high aspect ratio structures: a comparison of drying techniques via electrical stiction analysis

dc.typeMeeting abstract
dspace.entity.typePublication
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