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Characterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS Technologies

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dc.contributor.authorSteegen, An
dc.contributor.thesisadvisorMaex, Karen
dc.contributor.thesisadvisorVan Houtte, Paul
dc.date.accessioned2021-10-14T17:52:53Z
dc.date.available2021-10-14T17:52:53Z
dc.date.embargo9999-12-31
dc.date.issued2001-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5673
dc.title

Characterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS Technologies

dc.typePHD thesis
dspace.entity.typePublication
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