Publication:

Benchmarking Ge1-xSnx CVD Epitaxy using GeH4 and Ge2H6

Date

2016-11
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorVohra, Anurag
dc.contributor.authorLoo, Roger
dc.contributor.authorKohen, David
dc.contributor.authorMargetis, Joe
dc.contributor.authorTolle, John
dc.contributor.authorStange, Daniela
dc.contributor.authorBuca, Dan
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorVohra, Anurag
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-23T16:54:44Z
dc.date.available2021-10-23T16:54:44Z
dc.date.issued2016-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27556
dc.source.beginpage20
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
dc.source.endpage21
dc.title

Benchmarking Ge1-xSnx CVD Epitaxy using GeH4 and Ge2H6

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions